Vanadium Carbide - VC

Vanadium Carbide Sputtering Target - VC Target

Purity--- 99.9%

Shape---Discs, Plate, Step (Dia ≤480mm, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤420mm, Width ≤270mm, Thickness ≥1mm)

Tube( Diameter< 300mm, Thickness >2mm ) 

Application -

Vanadium Carbide Evaporation Material - VC Granule

Purity - 99.9%

Granule - 3-6mm, 1-6mm

Application - Coating for thin film

Vanadium Carbide Powder - VC

Purity--- 99.9%

Granularity --- 100mesh、200 mesh、325mesh

Relation Products:

Boron carbide sputtering target - B4C;

Boron Carbide(B4C) Sputtering Targets;

Chromium Carbide (Cr3C2) Sputtering Targets;

Hafnium Carbide(HfC) Sputtering Targets;

Iron Carbide (Fe3C) Sputtering Targets;

Molybdenum Carbide (Mo2C) Sputtering Targets;

Niobium Nitride (NbC) Sputtering Targets;

Silicom Carbide (SiC) Sputtering Targets;

Tantalum Carbide (TaC) Sputtering Targets;

Titanium Carbide(TiC) Sputtering Targets;

Titanium Carbonitride (TiCN) Sputtering Targets;

Tungsten Carbide (W2C) Sputtering Targets;

Tungsten Carbide (WC) Sputtering Targets;

Tungsten Carbide Doped with Nickel (WC+Ni);

Tungsten Carbide Doped with Cobalt (WC+Co);

Vanadium Carbide (VC) Sputtering Targets;

Zirconium Carbide(ZrC) Sputtering Targets;